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The last 5 uploaded publications
A Generalized Electrochemical Aggregative Growth Mechanism
Jon Ustarroz, Joshua A. Hammons, Thomas Altantzis, Annick Hubin, Sara Bals, Herman Terryn (2013). A Generalized Electrochemical Aggregative Growth Mechanism. Journal of the American Chemical Society, 135(31), pp. 11550-11561, DOI: 10.1021/ja402598k.
Article235 days agoNew Insights into the Early Stages of Nanoparticle Electrodeposition
Jon Ustarroz, Xiaoxing Ke, Annick Hubin, Sara Bals, Herman Terryn (2011). New Insights into the Early Stages of Nanoparticle Electrodeposition. The Journal of Physical Chemistry C, 116(3), pp. 2322-2329, DOI: 10.1021/jp210276z.
Article235 days agoComprehensive Study of the Electrodeposition of Nickel Nanostructures from Deep Eutectic Solvents: Self-Limiting Growth by Electrolysis of Residual Water
El Amine Mernissi Cherigui, Kadir Sentosun, Pieter Bouckenooge, Hans Vanrompay, Sara Bals, Herman Terryn, Jon Ustarroz (2017). Comprehensive Study of the Electrodeposition of Nickel Nanostructures from Deep Eutectic Solvents: Self-Limiting Growth by Electrolysis of Residual Water. The Journal of Physical Chemistry C, 121(17), pp. 9337-9347, DOI: 10.1021/acs.jpcc.7b01104.
Article235 days agoThe Role of Nanocluster Aggregation, Coalescence, and Recrystallization in the Electrochemical Deposition of Platinum Nanostructures
Jon Ustarroz, Thomas Altantzis, Joshua A. Hammons, Annick Hubin, Sara Bals, Herman Terryn (2014). The Role of Nanocluster Aggregation, Coalescence, and Recrystallization in the Electrochemical Deposition of Platinum Nanostructures. Chemistry of Materials, 26(7), pp. 2396-2406, DOI: 10.1021/cm403178b.
Article235 days agoElectrodeposition of Ag nanoparticles onto carbon coated TEM gridsA direct approach to study early stages of nucleation
Jon Ustarroz, Uma Gupta, Annick Hubin, Sara Bals, Herman Terryn (2010). Electrodeposition of Ag nanoparticles onto carbon coated TEM gridsA direct approach to study early stages of nucleation. Electrochemistry Communications, 12(12), pp. 1706-1709, DOI: 10.1016/j.elecom.2010.10.002.
Article235 days ago