On the relationship between the plasma characteristics, the microstructure and the optical properties of reactively sputtered TiO<sub>2</sub> thin films
M. Michiels, Axel Hemberg, Thomas Godfroid, Olivier Douhéret, Julien L. Colaux, Pavel Moskovkin, Stéphane Lucas, Amaël Caillard, A.L. Thomann, Priya Laha, Herman Terryn, M. Voué, Adriano Panepinto, Rony Snyders, Stéphanos Konstantinidis (2021). On the relationship between the plasma characteristics, the microstructure and the optical properties of reactively sputtered TiO<sub>2</sub> thin films. Journal of Physics D Applied Physics, 54(41), pp. 415202-415202, DOI: 10.1088/1361-6463/ac118e.
