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Suihan Cui, Qiuhao Chen, Yu-Xiang Guo, Lei Chen, Zheng Jin, Xiteng Li, Chao Yang, Zhongcan Wu, Xiongyu Su, Zhengyong Ma, Ricky K.Y. Fu, Xiubo Tian, Paul Kim Ho Chu, Zhongzhen Wu (2022). High-precision modeling of dynamic etching in high-power magnetron sputtering. , 55(32), DOI: https://doi.org/10.1088/1361-6463/ac717b.
