Chemical vapor deposition growth of continuous monolayer antiferromagnetic CrOCl films
Chao Chen, Yulu Liu, Hong‐Yan Lu, Zihao Wang, Bowen Zheng, Qian Guo, Jingkuan Xiao, Ping Wang, Wanting Xu, Yulin Han, M Chen, Xiaofan Cai, Jiabei Huang, Yaqing Han, Di Zhang, Renjun Du, Alexander S. Mayorov, Z.-J Li, Shuai Zhang, Yi Huang, Tingting Cheng, Zhaolong Chen, Ronghua Liu, Nujiang Tang, Haibo Ni, Di Wu, Libo Gao, Xiaoxiang Xi, Qiang-Hua Wang, Lei Wang, Konstantin ‘kostya’ Novoselov, Geliang Yu (2025). Chemical vapor deposition growth of continuous monolayer antiferromagnetic CrOCl films. , 16(1), DOI: https://doi.org/10.1038/s41467-025-66142-8.
