<title>Using neutral metastable argon atoms and contamination lithography to form nanostructures in silicon, silicon dioxide, and gold</title>
K. S. Johnson, Karl K. Berggren, Andrew J. Black, Charles T. Black, A. P. Chu, Nynke H. Dekker, D. C. Ralph, J. H. Thywissen, R. Younkin, Mara Prentiss, M. Tinkham, George M M Whitesides (1997). <title>Using neutral metastable argon atoms and contamination lithography to form nanostructures in silicon, silicon dioxide, and gold</title>. , 2995, DOI: https://doi.org/10.1117/12.273746.
