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  5. Novel Structural Characterisations of Insulating and Electron Beam Sensitive Materials Employing Low Voltage High Resolution Scanning Electron Microscopy

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Article
en
2013

Novel Structural Characterisations of Insulating and Electron Beam Sensitive Materials Employing Low Voltage High Resolution Scanning Electron Microscopy

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en
2013
Vol 48
Vol. 48
www.cnm.manchester.ac.uk/images/JEOL_news…

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Omar M Yaghi
Omar M Yaghi

University of California, Berkeley

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Osamu Terasaki
Haesung Cho
Minhyung Cho
+19 more

Abstract

Following our previous appraisal of high resolution scanning electron microscopy (JEOL News 50 Anniversary Issue) we return to assess the increasing information from nano materials (mesoporous materials, zeotypes, MOF and core-shell materials) delivered to the microscopist through utilisation of scanning electron microscopes employing lenses made from combinations of both electric and magnetic fields. The current limitations are also discussed in detail along with future improvements.

How to cite this publication

Osamu Terasaki, Haesung Cho, Minhyung Cho, HuYoung Jeong, Shunsuke Asahina, Yusuke Sakuda, Mituo Suga, Masato Kudo, Takeshi Nokuo, Zheng Liu, Sam M. Stevens, Michael W. Anderson, DianaCarolina GaleanoNunez, Ferdi Schüth, Tomas Kjellman, Viveka Alfredsson, Lu Han, Shunai Che, Hexiang Deng, Omar M Yaghi, Kanghee Cho, Ryong Ryoo (2013). Novel Structural Characterisations of Insulating and Electron Beam Sensitive Materials Employing Low Voltage High Resolution Scanning Electron Microscopy. , 48

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Publication Details

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Article

Year

2013

Authors

22

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Language

en

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